Sputtering yields

Sputtering systems are generaly calibrated to estimate the deposition rate under the given condition, however yield data of the type described are often used to estimate rate changes when changing coating materials and in estimating the amount of materials removed during sputter cleaning and bias sputtering.

The erosion rate is given by:

R = 6.23 J S Ma / δ (nm/min)

J is ion current density in mA/cm2
S is sputteirng yields in atoms/ion
Ma is atomic weight in grams
δ density of the target material in g/cm3

Sputtering rates in planar diode systems: inelastic charge exchange collisions between accelerated ions and neutral sputtering gas species affect the average energy of ions striking the target as:

E = e Vt

Vt is applied target potential




The handbook of Sputtering
http://books.google.co.uk/books?hl=en&lr=&id=3lm17uW7TF0C&oi=fnd&pg=PA249&dq=Thornton+J+A+1978+J.+Vac.+Sci.+Technol.+15+171%E2%80%937&ots=TtAZfsgElo&sig=J6e5wV8Fuiu3ExGB_dwMNsTsovo#PPA262,M1



Bohr knew that a photon's energy was equal to Planck's constant times its frequency (this formula was discovered by Einstein during his work on the photoelectric effect).

http://www.colorado.edu/physics/2000/quantumzone/balmer2.html